• DocumentCode
    3035996
  • Title

    Dynamic deadband control in semiconductor manufacturing

  • Author

    Ko, Hyo-Heon ; Kim, Jihyun ; Baek, Jun-Geol ; Kim, Sung-Shick

  • Author_Institution
    Div. of Inf. Manage. Eng., Korea Univ., Seoul, South Korea
  • fYear
    2009
  • fDate
    17-20 Nov. 2009
  • Firstpage
    412
  • Lastpage
    416
  • Abstract
    This paper proposes efficient control method to minimize process error and to reduce process variance in semiconductor manufacturing. Photo-lithography process make more detailed complex circuit in semiconductor process and is important for quality. However, obstacles were in the process of the facility itself, vibration, wear and tear, and product and process change and environmental impact are difficult to control. In addition, the existing process that is being used for a series of statistical techniques to control the problem was amplified for the change. Therefore, this paper propose effective process control method for reducing process variance by reducing the unnecessary obstacles, quickly detecting changes in the fair, and accurately reflect the degree of change. This study proposes the dynamic deadband control that has a region (band) to detect the status of a process of change and, according to detect changes in the region itself moves the process control. In this research, the semiconductor manufacturing company is supported to perform a more precise control and reduction of fluctuations due to be producing products of uniform quality. Also it can contribute to yield due to the quality incensement, and more and more minted the process control in semiconductor.
  • Keywords
    integrated circuit manufacture; process control; quality control; semiconductor industry; dynamic deadband control; fluctuation control; fluctuation reduction; photo-lithography process; process control method; process error minimization; process variance reduction; semiconductor manufacturing company; statistical techniques; Assembly; Circuits; Companies; Electronics industry; Error correction; Fluctuations; Manufacturing processes; Process control; Production; Semiconductor device manufacture;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Assembly and Manufacturing, 2009. ISAM 2009. IEEE International Symposium on
  • Conference_Location
    Suwon
  • Print_ISBN
    978-1-4244-4627-8
  • Electronic_ISBN
    978-1-4244-4628-5
  • Type

    conf

  • DOI
    10.1109/ISAM.2009.5376977
  • Filename
    5376977