DocumentCode :
3036798
Title :
Optical Probing of FinFETs
Author :
Fine, J. ; Young, Chadwin D. ; Hobbs, Chris ; Bersuker, Gennadi ; Lundquist, T. ; Tsao, C.-C.
Author_Institution :
DCG Syst., Inc., Fremont, CA, USA
fYear :
2013
fDate :
15-19 July 2013
Firstpage :
28
Lastpage :
31
Abstract :
Emission, Laser Voltage Imaging, and Laser Voltage Probing data have been acquired from dual-gate fin field-effect-transistors (FinFETs). These optical probing techniques are applied to devices measuring 25 nm at their smallest dimension. Our results demonstrate that images and data collected from FinFET structures are qualitatively similar to those from a planar transistor.
Keywords :
MOSFET; FinFET structures; dual-gate fin field-effect-transistors; emission; laser voltage imaging; laser voltage probing data; optical probing techniques; planar transistor; size 25 nm; Decision support systems; Failure analysis; Integrated circuits; MOS devices;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Physical and Failure Analysis of Integrated Circuits (IPFA), 2013 20th IEEE International Symposium on the
Conference_Location :
Suzhou
ISSN :
1946-1542
Print_ISBN :
978-1-4799-1241-4
Type :
conf
DOI :
10.1109/IPFA.2013.6599121
Filename :
6599121
Link To Document :
بازگشت