Title :
Oxide-based RRAM: Unified microscopic principle for both unipolar and bipolar switching
Author :
Gao, B. ; Kang, J.F. ; Chen, Y.S. ; Zhang, F.F. ; Chen, B. ; Huang, P. ; Liu, L.F. ; Liu, X.Y. ; Wang, Y.Y. ; Tran, X.A. ; Wang, Z.R. ; Yu, H.Y. ; Chin, Albert
Author_Institution :
Key Lab. of Microelectron. Devices & Circuits, Peking Univ., Beijing, China
Abstract :
A unified microscopic principle is proposed to clarify resistive switching behaviors of transition metal oxide based resistive random access memories (RRAM) for the first time. In this unified microscopic principle, both unipolar and bipolar switching characteristics of RRAM are correlated with the distribution of localized oxygen vacancies in the oxide switching layer, which is governed by the generation and recombination with dissociative oxygen ions. Based on the proposed microscopic principle, an atomistic simulation method is developed to evaluate critical memory performance, and successfully conduct the device optimization. The experimental data are well in line with the developed simulation method.
Keywords :
random-access storage; atomistic simulation method; bipolar switching characteristic; critical memory performance; device optimization; dissociative oxygen ions; localized oxygen vacancies; oxide switching layer; oxide-based RRAM; resistive random access memories; resistive switching behaviors; transition metal oxide; unified microscopic principle; unipolar switching characteristic; Hafnium oxide; Mathematical model; Microscopy; Resistance; Switches; Voltage measurement;
Conference_Titel :
Electron Devices Meeting (IEDM), 2011 IEEE International
Conference_Location :
Washington, DC
Print_ISBN :
978-1-4577-0506-9
Electronic_ISBN :
0163-1918
DOI :
10.1109/IEDM.2011.6131573