• DocumentCode
    3037821
  • Title

    Oxide-based RRAM: Unified microscopic principle for both unipolar and bipolar switching

  • Author

    Gao, B. ; Kang, J.F. ; Chen, Y.S. ; Zhang, F.F. ; Chen, B. ; Huang, P. ; Liu, L.F. ; Liu, X.Y. ; Wang, Y.Y. ; Tran, X.A. ; Wang, Z.R. ; Yu, H.Y. ; Chin, Albert

  • Author_Institution
    Key Lab. of Microelectron. Devices & Circuits, Peking Univ., Beijing, China
  • fYear
    2011
  • fDate
    5-7 Dec. 2011
  • Abstract
    A unified microscopic principle is proposed to clarify resistive switching behaviors of transition metal oxide based resistive random access memories (RRAM) for the first time. In this unified microscopic principle, both unipolar and bipolar switching characteristics of RRAM are correlated with the distribution of localized oxygen vacancies in the oxide switching layer, which is governed by the generation and recombination with dissociative oxygen ions. Based on the proposed microscopic principle, an atomistic simulation method is developed to evaluate critical memory performance, and successfully conduct the device optimization. The experimental data are well in line with the developed simulation method.
  • Keywords
    random-access storage; atomistic simulation method; bipolar switching characteristic; critical memory performance; device optimization; dissociative oxygen ions; localized oxygen vacancies; oxide switching layer; oxide-based RRAM; resistive random access memories; resistive switching behaviors; transition metal oxide; unified microscopic principle; unipolar switching characteristic; Hafnium oxide; Mathematical model; Microscopy; Resistance; Switches; Voltage measurement;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices Meeting (IEDM), 2011 IEEE International
  • Conference_Location
    Washington, DC
  • ISSN
    0163-1918
  • Print_ISBN
    978-1-4577-0506-9
  • Electronic_ISBN
    0163-1918
  • Type

    conf

  • DOI
    10.1109/IEDM.2011.6131573
  • Filename
    6131573