Title :
Design and implementation of an adaptive controller for electron beam evaporation system
Author :
Ahadi, Majid ; Jamshidi, Kambiz ; Rashidian, Bizhan
Author_Institution :
Sharif Univ. of Technol., Tehran, Iran
Abstract :
In this paper, design and implementation of a high accuracy alloy evaporation system is reported. The thermodynamics, modeling, identification and controller designs of the system are discussed. All the necessary hardware and software have been made and tested. The performance and accuracy of the system have been verified using RBS (Rutherford backscattering) and PIXE (particle induced X-ray emission) (Sze, 1989) of deposited films (Ahadi and Rashidian, 1999). There is no theoretical limitation for the number of elements in the alloy in the method presented here; however, the system reported here has been implemented for use of up to 6 different materials for formation of the desired alloy
Keywords :
Rutherford backscattering; X-ray chemical analysis; adaptive control; controllers; electron beam deposition; integrated circuit metallisation; ion microprobe analysis; process control; semiconductor device metallisation; semiconductor process modelling; PIXE; RBS; Rutherford backscattering; adaptive controller; adaptive controller design; adaptive controller implementation; alloy evaporation system; controller design; deposited films; electron beam evaporation system; identification; modeling; multi-element alloy evaporation; particle induced X-ray emission; system accuracy; system performance; thermodynamics; Adaptive control; Control system synthesis; Control systems; Electron beams; Microelectronics; Programmable control; Real time systems; Sputtering; Thermodynamics; Thin film sensors;
Conference_Titel :
Microelectronics, 2000. ICM 2000. Proceedings of the 12th International Conference on
Conference_Location :
Tehran
Print_ISBN :
964-360-057-2
DOI :
10.1109/ICM.2000.916475
