Title :
Analytic modeling of the bias temperature instability using capture/emission time maps
Author :
Grasser, T. ; Wagner, P.-J. ; Reisinger, H. ; Aichinger, Th ; Pobegen, G. ; Nelhiebel, M. ; Kaczer, B.
Author_Institution :
Inst. for Microelectron., Tech. Univ. Wien, Vienna, Austria
Abstract :
Despite a number of recent advances made in the understanding of the bias temperature instability (BTI), there is still no simple model available which can capture BTI degradation during DC or duty-factor (DF) dependent stress and the following recovery. By exploiting the intuitive features of the recently proposed capture/emission time (CET) maps [1, 2], we suggest an analytic model capable of handling a wide number of BTI stress and recovery patterns. As the model captures both the temperature- and bias- dependence of the degradation, it allows for realistic lifetime extrapolation. Compared to available models which do not consider the saturation of the degradation, our model predicts considerably more optimistic lifetimes.
Keywords :
extrapolation; integrated circuit modelling; stability; BTI degradation; DC dependent stress; analytic model; bias temperature instability; bias-dependence; capture/emission time maps; duty-factor dependent stress; intuitive features; lifetime extrapolation; optimistic lifetimes; recovery patterns; temperature-dependence; Analytical models; Data models; Degradation; Extrapolation; Gaussian distribution; Numerical models; Stress;
Conference_Titel :
Electron Devices Meeting (IEDM), 2011 IEEE International
Conference_Location :
Washington, DC
Print_ISBN :
978-1-4577-0506-9
Electronic_ISBN :
0163-1918
DOI :
10.1109/IEDM.2011.6131624