• DocumentCode
    3039446
  • Title

    Reliability characterization exploring extreme conditions for chips´ design optimization

  • Author

    Chu, Thomas P.

  • Author_Institution
    X-FAB Sarawak, Kuching, Malaysia
  • fYear
    2013
  • fDate
    15-19 July 2013
  • Firstpage
    654
  • Lastpage
    657
  • Abstract
    Lifetime determination is one of the reliability key tasks to have an accurate estimation of the period of time that can still survive with a certain confidence level under the specific operating conditions to perform the respective function of the applications. Various reliability tests have been designed to reveal and assess the respective wear-out degradation mechanisms. This paper presents herewith, the methodology of reliability characterization from the lifetime empirical models so as to define the corresponding Safe Operating Area (SOA) exploring to the extreme limits (in terms of operating voltages, junction temperature, area of interests or other critical dimensions, confidence bounds corresponding to failures ppm level, degradation parameters etc...). Modeling of lifetimes among these critical parameters can be done in order to find an optimized solution for a specific design. As such, a thorough reliability characterization is very important for the robust design for reliability.
  • Keywords
    integrated circuit design; integrated circuit modelling; integrated circuit reliability; integrated circuit testing; SOA; chip design optimization; confidence bound; degradation parameter; failure ppm level; junction temperature; lifetime determination; lifetime empirical model; operating voltages; reliability characterization; reliability tests; robust design; safe operating area; wear-out degradation mechanism; Failure analysis; Integrated circuit reliability; Reliability engineering; Semiconductor optical amplifiers; Stress; Temperature;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Physical and Failure Analysis of Integrated Circuits (IPFA), 2013 20th IEEE International Symposium on the
  • Conference_Location
    Suzhou
  • ISSN
    1946-1542
  • Print_ISBN
    978-1-4799-1241-4
  • Type

    conf

  • DOI
    10.1109/IPFA.2013.6599245
  • Filename
    6599245