• DocumentCode
    3040706
  • Title

    Leakage mechanism due to floating body and countermeasure on dynamic retention mode of SOI-DRAM

  • Author

    Morishita, F. ; Suma, K. ; Hirose, M. ; Tsuruda, T. ; Yamaguchi, Y. ; Eimori, T. ; Oashi, T. ; Arimoto, K. ; Inoue, Y. ; Nishimura, T.

  • Author_Institution
    ULSI Lab., Mitsubishi Electr. Corp., Itami, Japan
  • fYear
    1995
  • fDate
    6-8 June 1995
  • Firstpage
    141
  • Lastpage
    142
  • Abstract
    SOI-DRAM is expected to have long data retention time because the data leakage path is limited only through a cell transistor. High speed low power operation is realized due to reduced junction capacitances. Moreover, since the capacitance ratio Cb/Cs is reduced, the read out signal amplitude increases. For these reasons SOI is well suited to low power supply voltage DRAMs. However, because SOI uses body-floating transistors for memory cells, there is a possibility that majority carriers within the floating body can cause problems. To date, only the static data retention characteristics have been reported, with nothing written about the dynamic data retention characteristics for full DRAM operation. This paper details the results of an analysis of the floating body caused leakage mechanism and its effect on dynamic data retention. A proposal is made to obtain superior dynamic data retention time.
  • Keywords
    DRAM chips; capacitance; equivalent circuits; integrated circuit modelling; leakage currents; silicon-on-insulator; 0.5 V; 520 s; SOI DRAM; Si; body-floating transistors; countermeasure; data retention time; dynamic RAM; dynamic retention mode; floating body leakage mechanism; junction capacitance; low power supply voltage DRAM; majority carriers; memory cells; Capacitance; Cause effect analysis; Leakage current; Low voltage; Power supplies; Proposals; Random access memory; Substrates; Subthreshold current; Ultra large scale integration;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    VLSI Technology, 1995. Digest of Technical Papers. 1995 Symposium on
  • Conference_Location
    Kyoto, Japan
  • Print_ISBN
    0-7803-2602-4
  • Type

    conf

  • DOI
    10.1109/VLSIT.1995.520897
  • Filename
    520897