Electron beam patterning on permeable polymer membranes for nanolithography and microfluidic applications

Author

Schaper, C. ; Tay, A.

Author_Institution

Inf. Syst. Lab., Stanford Univ., CA, USA

fYear

1999

fDate

1999

Firstpage

91

Lastpage

93

Abstract

Initial results are described on using lithographic techniques to pattern permeable polymer membranes using electron beam and optical techniques. The patterned membranes have a spatially selective permeability to electrolytes or to vapor phase reactants. Applications for the membranes include a non-optical method for patterning and for microfluidic applications. Two methods are demonstrated for fabricating the permeable membranes including patterning directly on the surface and on a sputtered metal coating

Keywords

electron beam lithography; masks; membranes; microfluidics; nanotechnology; polymer films; electrolytes; electron beam patterning; lithographic tool; mask fabrication method; microfluidic applications; nanolithography applications; nonoptical patterning method; permeable polymer membranes; spatially selective permeability; sputtered metal coating; vapor phase reactants; Aluminum; Biomembranes; Chemicals; Coatings; Electron beams; Etching; Lithography; Microfluidics; Nanolithography; Optical polymers;

fLanguage

English

Publisher

ieee

Conference_Titel

University/Government/Industry Microelectronics Symposium, 1999. Proceedings of the Thirteenth Biennial

Conference_Location

Minneapolis, MN

Print_ISBN

0-7803-5240-8

Type

conf

DOI

10.1109/UGIM.1999.782829

Filename

782829