Applications of mathematical systems science to nanolithography of integrated circuits

Author

Schaper, C. ; Kailath, T.

Author_Institution

Inf. Syst. Lab., Stanford Univ., CA, USA

fYear

1999

fDate

1999

Firstpage

120

Lastpage

122

Abstract

An overview is given describing applications of multivariable control, signal processing, optimization, modeling and computation to the lithography sequence. We discuss areas in the patterning process where mathematical methods can play a significant role including optical proximity correction, phase shifting mask design, alignment, and stage control for nanopositioning. We also include a discussion on systems applications in the general area of photoresist processing for lithography with emphasis on the thermal process

Keywords

integrated circuit modelling; lithography; masks; multivariable control systems; nanotechnology; optimisation; photolithography; process control; signal processing; alignment; integrated circuits; mathematical systems science; modeling; multivariable control; nanolithography; nanopositioning; optical proximity correct; optimization; overview; patterning process; phase shifting mask design; photoresist processing; signal processing; stage control; systems applications; thermal process; Application specific integrated circuits; Computational modeling; Integrated circuit modeling; Lithography; Nanolithography; Optical sensors; Optical signal processing; Particle beam optics; Resists; Temperature sensors;

fLanguage

English

Publisher

ieee

Conference_Titel

University/Government/Industry Microelectronics Symposium, 1999. Proceedings of the Thirteenth Biennial

Conference_Location

Minneapolis, MN

Print_ISBN

0-7803-5240-8

Type

conf

DOI

10.1109/UGIM.1999.782836

Filename

782836