• DocumentCode
    3041921
  • Title

    Trends in single-wafer processing

  • Author

    Doering, R.R.

  • Author_Institution
    Texas Instruments Inc., Dallas, TX, USA
  • fYear
    1992
  • fDate
    2-4 June 1992
  • Firstpage
    2
  • Lastpage
    5
  • Abstract
    It is pointed out that one of the most significant trends in semiconductor manufacturing over the past three decades has been the gradual replacement of batch processing with single-wafer processing. Two other trends, the use of larger silicon wafers (to reduce manufacturing cost) and the necessity for more demanding process-performance specifications (to allow continued device circuit scaling), have driven this move to single-wafer equipment for many processes. It is now technically feasible to produce silicon integrated circuits with 100% single-wafer processing. In the next decade, it may also become economically feasible to do so.<>
  • Keywords
    elemental semiconductors; integrated circuit technology; monolithic integrated circuits; silicon; Si; device circuit scaling; manufacturing cost; monolithic IC; process-performance specifications; semiconductor manufacturing; single-wafer processing; Costs; Electronics industry; Instruments; Integrated circuit manufacture; Manufacturing automation; Manufacturing processes; Process control; Rapid thermal processing; Semiconductor device manufacture; Silicon;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    VLSI Technology, 1992. Digest of Technical Papers. 1992 Symposium on
  • Conference_Location
    Seattle, WA, USA
  • Print_ISBN
    0-7803-0698-8
  • Type

    conf

  • DOI
    10.1109/VLSIT.1992.200629
  • Filename
    200629