DocumentCode
3041921
Title
Trends in single-wafer processing
Author
Doering, R.R.
Author_Institution
Texas Instruments Inc., Dallas, TX, USA
fYear
1992
fDate
2-4 June 1992
Firstpage
2
Lastpage
5
Abstract
It is pointed out that one of the most significant trends in semiconductor manufacturing over the past three decades has been the gradual replacement of batch processing with single-wafer processing. Two other trends, the use of larger silicon wafers (to reduce manufacturing cost) and the necessity for more demanding process-performance specifications (to allow continued device circuit scaling), have driven this move to single-wafer equipment for many processes. It is now technically feasible to produce silicon integrated circuits with 100% single-wafer processing. In the next decade, it may also become economically feasible to do so.<>
Keywords
elemental semiconductors; integrated circuit technology; monolithic integrated circuits; silicon; Si; device circuit scaling; manufacturing cost; monolithic IC; process-performance specifications; semiconductor manufacturing; single-wafer processing; Costs; Electronics industry; Instruments; Integrated circuit manufacture; Manufacturing automation; Manufacturing processes; Process control; Rapid thermal processing; Semiconductor device manufacture; Silicon;
fLanguage
English
Publisher
ieee
Conference_Titel
VLSI Technology, 1992. Digest of Technical Papers. 1992 Symposium on
Conference_Location
Seattle, WA, USA
Print_ISBN
0-7803-0698-8
Type
conf
DOI
10.1109/VLSIT.1992.200629
Filename
200629
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