Title :
Application of blind method to phase-shifting lithography
Author :
Jinbo, H. ; Yamashita, Yukihiko
Author_Institution :
Oki Electric Industry Co. Ltd., Tokyo, Japan
Abstract :
A blind mask and a simplified-blind (S-blind) mask proposed for phase shifting lithography are discussed. They both have very simple structures. Both the blind and S-blind methods are very effective in solving the bridging problem in single-layer-shifter phase-shifting lithography. These phase-shifting methods are suitable for 0.3- mu m lithography for the manufacture of 64-Mb DRAMs.<>
Keywords :
masks; photolithography; 0.3 micron; S-blind methods; blind mask; blind method; bridging problem; phase-shifting lithography; simplified blind mask; Bridges; Fabrication; Inspection; Lighting control; Lips; Lithography; Production; Resists; Rubber; Silicon;
Conference_Titel :
VLSI Technology, 1992. Digest of Technical Papers. 1992 Symposium on
Conference_Location :
Seattle, WA, USA
Print_ISBN :
0-7803-0698-8
DOI :
10.1109/VLSIT.1992.200674
