• DocumentCode
    3042764
  • Title

    Effects of annealing cycles on the electrical and morphological characteristics of Pd/Sn ohmic contacts to n-GaAs

  • Author

    Islam, M.S. ; McNally, Patrick J. ; Cameron, D.C. ; Herbert, P.A.F.

  • Author_Institution
    Sch. of Electron. Eng., Dublin City Univ., Ireland
  • Volume
    3
  • fYear
    1996
  • fDate
    13-16 May 1996
  • Firstpage
    1294
  • Abstract
    A novel Pd/Sn ohmic contact system is investigated for n-GaAs. The effects of annealing cycles on the electrical and morphological characteristics of the contacts are investigated using Scanning Electron Microscopy (SEM), surface profilometry measurements, Secondary Ion Mass Spectrometry (SIMS) and current-voltage (I-V) measurements. SEM and surface profilometry measurements are employed to investigate the surface morphology of the contacts. Contact depth profiles are analyzed by SIMS. Contact resistivities, pc, of the proposed metallization are measured utilizing a conventional Transmission Line Model (TLM) method. Annealing cycles show a significant effect on contact properties. Annealing at 360°C for 30 min yielded the lowest pc of ~3.26×10-5 Ω-cm2 with Pd(30 nm)/Sn(150 nm) contacts. Two-step annealing improves both electrical and morphological characteristics of Pd/Sn contacts. A lowest pc of ~1.49×10-5 Ω-cm2 is obtained with same contacts under two-step annealing (225°C, 50 s+350°C, 15 min) condition. The SIMS depth profiles of the contacts are nearly identical for both types of annealing
  • Keywords
    III-V semiconductors; annealing; contact resistance; gallium arsenide; ohmic contacts; palladium; scanning electron microscopy; secondary ion mass spectra; semiconductor device metallisation; semiconductor-metal boundaries; surface structure; tin; 15 min; 225 C; 30 min; 350 C; 360 C; 50 s; I-V measurements; Pd-Sn-GaAs; Pd/Sn ohmic contacts; SEM; SIMS; TLM method; annealing cycles; contact depth profiles; contact resistivities; current-voltage measurements; electrical characteristics; metallization; morphological characteristics; n-GaAs; n-type; scanning electron microscopy; secondary ion mass spectrometry; surface morphology; surface profilometry measurements; transmission line model method; two-step annealing; Annealing; Conductivity; Current measurement; Electric variables measurement; Mass spectroscopy; Ohmic contacts; Scanning electron microscopy; Surface morphology; Tin; Transmission line measurements;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electrotechnical Conference, 1996. MELECON '96., 8th Mediterranean
  • Conference_Location
    Bari
  • Print_ISBN
    0-7803-3109-5
  • Type

    conf

  • DOI
    10.1109/MELCON.1996.551183
  • Filename
    551183