DocumentCode :
3044009
Title :
MOVPE Growth Chamber Pressure Influence In Si Doping Of InP And InGaAs
Author :
Narayanan, A. ; Nguyen, C. ; Hooper, W. ; Rench, D.
Author_Institution :
Hughes Research Laboratories
fYear :
1994
fDate :
6-13 Jul 1994
Keywords :
Doping; Epitaxial growth; Epitaxial layers; Indium gallium arsenide; Indium phosphide; Laboratories; Temperature;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Integrated Optoelectronics, 1994., Proceedings of IEE/LEOS Summer Topical Meetings:
Print_ISBN :
0-7803-1752-1
Type :
conf
DOI :
10.1109/LEOSST.1994.700535
Filename :
700535
Link To Document :
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