Title :
Selective Epitaxy With In Situ Mask Processing
Author :
Ozasa, Kazunari ; Kim, Eunn Kyu ; Ye, Tianchun ; Aoyagi, Yoshinobu
Author_Institution :
The Institute Of Physical And Chemical Research
Keywords :
Epitaxial growth; Etching; Gallium arsenide; Hydrogen; Indium; Plasma applications; Plasma chemistry; Plasma materials processing; Plasma temperature; Space vector pulse width modulation;
Conference_Titel :
Integrated Optoelectronics, 1994., Proceedings of IEE/LEOS Summer Topical Meetings:
Print_ISBN :
0-7803-1752-1
DOI :
10.1109/LEOSST.1994.700536
