Title :
Kinetics Of Islands And Monolayer Steps In Molecular Beam Epitaxy Revealed By In -situ Scanning Electron Microscopy
Author_Institution :
NTT LSI Laboratories
Keywords :
Annealing; Atomic layer deposition; Buffer layers; Electron beams; Gallium arsenide; Kinetic theory; Molecular beam epitaxial growth; Rough surfaces; Scanning electron microscopy; Surface roughness;
Conference_Titel :
Integrated Optoelectronics, 1994., Proceedings of IEE/LEOS Summer Topical Meetings:
Print_ISBN :
0-7803-1752-1
DOI :
10.1109/LEOSST.1994.700537