DocumentCode :
3044323
Title :
Kinetics Of Islands And Monolayer Steps In Molecular Beam Epitaxy Revealed By In -situ Scanning Electron Microscopy
Author :
Inoue, N.
Author_Institution :
NTT LSI Laboratories
fYear :
1994
fDate :
6-13 Jul 1994
Keywords :
Annealing; Atomic layer deposition; Buffer layers; Electron beams; Gallium arsenide; Kinetic theory; Molecular beam epitaxial growth; Rough surfaces; Scanning electron microscopy; Surface roughness;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Integrated Optoelectronics, 1994., Proceedings of IEE/LEOS Summer Topical Meetings:
Print_ISBN :
0-7803-1752-1
Type :
conf
DOI :
10.1109/LEOSST.1994.700537
Filename :
700537
Link To Document :
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