Title :
Chemical Beam Etching With Monolayer Control
Author :
Tsang, W.T. ; Kapre, R.M. ; Chiu, T.H. ; Williams, M.D. ; Ferguson, J.F.
Author_Institution :
AT&T Bell
Keywords :
Chemicals; Etching; Gallium arsenide; Indium phosphide; Monitoring; Morphology;
Conference_Titel :
Integrated Optoelectronics, 1994., Proceedings of IEE/LEOS Summer Topical Meetings:
Print_ISBN :
0-7803-1752-1
DOI :
10.1109/LEOSST.1994.700538
