• DocumentCode
    3045268
  • Title

    Degradation of Mechanical Strength at Si/SiO2 Interface on SOI Wafers under Cyclic Loading

  • Author

    Ando, T. ; Takumi, T. ; Sato, K.

  • Author_Institution
    Dept. of Micro-Nano Syst. Eng., Nagoya Univ., Nagoya
  • fYear
    2009
  • fDate
    25-29 Jan. 2009
  • Firstpage
    665
  • Lastpage
    668
  • Abstract
    Fatigue tests of silicon stepped cantilevers fabricated from silicon on insulator (SOI) wafers were conducted under the bending mode to evaluate the effect of cyclic loading on fractures occurring in silicon and Si/SiO2 interfaces. The specimen in the quasi-static mode fractured at the stress concentration site on the silicon specimens. However, during the fatigue tests the cantilever broke after 104 cycles with stress amplitude of nearly half of the bending strength at the fixed end comprising the Si/SiO2 interface. The results demonstrated that the cyclic stress durability in the Si/SiO2 interface is significantly lower than that of the silicon body.
  • Keywords
    bending strength; fatigue testing; mechanical strength; silicon compounds; silicon-on-insulator; stress analysis; SOI wafers; bending mode; cyclic loading; cyclic stress durability; fatigue tests; mechanical strength degradation; silicon on insulator; silicon stepped cantilevers; stress amplitude; Degradation; Etching; Fabrication; Fatigue; Micromachining; Silicon compounds; Silicon on insulator technology; Stress; Systems engineering and theory; Testing;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Micro Electro Mechanical Systems, 2009. MEMS 2009. IEEE 22nd International Conference on
  • Conference_Location
    Sorrento
  • ISSN
    1084-6999
  • Print_ISBN
    978-1-4244-2977-6
  • Electronic_ISBN
    1084-6999
  • Type

    conf

  • DOI
    10.1109/MEMSYS.2009.4805470
  • Filename
    4805470