DocumentCode
3045268
Title
Degradation of Mechanical Strength at Si/SiO2 Interface on SOI Wafers under Cyclic Loading
Author
Ando, T. ; Takumi, T. ; Sato, K.
Author_Institution
Dept. of Micro-Nano Syst. Eng., Nagoya Univ., Nagoya
fYear
2009
fDate
25-29 Jan. 2009
Firstpage
665
Lastpage
668
Abstract
Fatigue tests of silicon stepped cantilevers fabricated from silicon on insulator (SOI) wafers were conducted under the bending mode to evaluate the effect of cyclic loading on fractures occurring in silicon and Si/SiO2 interfaces. The specimen in the quasi-static mode fractured at the stress concentration site on the silicon specimens. However, during the fatigue tests the cantilever broke after 104 cycles with stress amplitude of nearly half of the bending strength at the fixed end comprising the Si/SiO2 interface. The results demonstrated that the cyclic stress durability in the Si/SiO2 interface is significantly lower than that of the silicon body.
Keywords
bending strength; fatigue testing; mechanical strength; silicon compounds; silicon-on-insulator; stress analysis; SOI wafers; bending mode; cyclic loading; cyclic stress durability; fatigue tests; mechanical strength degradation; silicon on insulator; silicon stepped cantilevers; stress amplitude; Degradation; Etching; Fabrication; Fatigue; Micromachining; Silicon compounds; Silicon on insulator technology; Stress; Systems engineering and theory; Testing;
fLanguage
English
Publisher
ieee
Conference_Titel
Micro Electro Mechanical Systems, 2009. MEMS 2009. IEEE 22nd International Conference on
Conference_Location
Sorrento
ISSN
1084-6999
Print_ISBN
978-1-4244-2977-6
Electronic_ISBN
1084-6999
Type
conf
DOI
10.1109/MEMSYS.2009.4805470
Filename
4805470
Link To Document