Immersion for 40nm production with 1.35NA

Summary form only given. Moving at impressive pace, immersion technology has entered volume manufacturing only 3 years after its technical feasibility had been proven. In 2006 Immersion lived up to its promise moving across the NA=1 barrier, with the shipment on 1.2NA exposure tools. Extending water immersion to its limit these tools are now followed by 1.35NA exposure tools for 40nm resolution being shipped in 2007. With an installed base of more than 30 tools the 1.2NA XT:1700Fi has enabled the transition of immersion from technology to volume production. The paper will review the technical status including optics, focus, leveling. Special emphasis will be given on long term performance stability. Regarding Defectivity, performance data as well as best practice process schemes will be discussed. In the second part of the paper the XT:1900Gi will be reviewed. With its industry leading NA of 1.35NA, special emphasis will be given on sub 40nm imaging results, including double patterning applications of 32nm and below. Overlay progress in line with double patterning applications will be presented.