Estimation of exposure parameters of chosen e-beam resists using variable shaped e-beam pattern generator

Author

Andok, R. ; Matay, L. ; Kostic, I. ; Bencurova, A. ; Nemec, Petr ; Konecnikova, A. ; Ritomsky, A.

Author_Institution

Inst. of Inf., Bratislava, Slovakia

fYear

2012

fDate

11-15 Nov. 2012

Firstpage

287

Lastpage

290

Abstract

In this article we present results from lithography experiments on PMMA (positive tone), and HSQ Fox-12 and SU-8 (negative tone) resists carried out on the ZBA variable shaped e-beam pattern generators. In order to obtain the necessary information needed for the optimization of the exposure control Point Spread Function PSF, several lithography tests are mentioned. The carried out measurements and analysis of the results help us in obtaining important information about the resists and exposure processes and enable us to practically verify the suggested methods of parameters extraction for a reliable exposure model.

Keywords

electron beam lithography; resists; HSQ Fox-12; PMMA; SU-8; ZBA variable shaped e-beam pattern generators; e-beam resists; exposure control point spread function optimization; exposure parameters; exposure processes; lithography experiments; lithography tests; parameters extraction; reliable exposure model; Generators; Glass; Lithography; Resists; Semiconductor device measurement; Sensitivity; Substrates;

fLanguage

English

Publisher

ieee

Conference_Titel

Advanced Semiconductor Devices & Microsystems (ASDAM), 2012 Ninth International Conference on

Conference_Location

Smolenice

Print_ISBN

978-1-4673-1197-7

Type

conf

DOI

10.1109/ASDAM.2012.6418541

Filename

6418541