DocumentCode
3047461
Title
Canon´s Development Status of EUVL Technologies
Author
Hasegawa, Takayuki ; Uzawa, Shigeyuki ; Kubo, Hiroyoshi ; Tsuji, Toshihiko
fYear
2007
fDate
5-8 Nov. 2007
Firstpage
26
Lastpage
27
Abstract
Canon has been developing the EUVL technologies for more than ten years. The current development status of EUVL technologies is presented. The small field exposure tool (SFET) is positioned as a cornerstone of the manufacturing technologies for the EUVL beta tool. LPP source and the DPP source are the most expecting methods for the EUVL beta tools.
Keywords
discharges (electric); plasma production by laser; ultraviolet lithography; ultraviolet sources; Canon´s development status; DPP source; EUVL technologies; LPP source; SFET; discharge produced plasma source; laser produced plasma source; small field exposure tool; Collaborative tools; Collaborative work; Manufacturing; Optical imaging; Optical sensors; Optical surface waves; Resists; System performance; Testing; Ultraviolet sources;
fLanguage
English
Publisher
ieee
Conference_Titel
Microprocesses and Nanotechnology, 2007 Digest of papers
Conference_Location
Kyoto
Print_ISBN
978-4-9902472-4-9
Type
conf
DOI
10.1109/IMNC.2007.4456087
Filename
4456087
Link To Document