Laser produced plasma light source for HVM-EUVL

Author

Komori, Hiroshi ; Hoshino, Hideo ; Suganuma, Takashi ; Nowak, Krzysztof ; Yabu, Takayuki ; Asayama, Takeshi ; Ueno, Yoshifumi ; Moriya, Masato ; Nakano, Masaki ; Someya, Hiroshi ; Abe, Tamotsu ; Soumagne, Georg ; Endo, Akira ; Mizoguchi, Hakaru ; Sumitani

Author_Institution

Extreme Ultraviolet Lithography Syst. Dev. Assoc. (EUVA), Hiratsuka

fYear

2007

fDate

5-8 Nov. 2007

Firstpage

30

Lastpage

31

Abstract

A major technical challenge of an extreme ultraviolet (EUV) light source for microlithography at 13.5 nm is the in-band power requirement of more than 115 W at the intermediate focus. The solution for HVM EUV lithography is a laser produced plasma light source with a cost effective CO₂ drive laser and a high conversion efficiency Sn target. To demonstrate this, a LPP source is developed for high volume manufacturing EUV lithography which is based on a high power CO₂ MOPA (Master Oscillator Power Amplifier) system and a tin target. It is concluded that the CO₂ laser driven Sn light source is the most promising candidate for HVM EUVL due to its scalability, high efficiency and long collector mirror lifetime.

Keywords

plasma production by laser; plasma sources; ultraviolet lithography; ultraviolet sources; CO₂; CO₂ laser; HVM EUV lithography; collector mirror; extreme ultraviolet light source; high power CO₂ MOPA system; high power CO₂ master oscillator power amplifier system; laser produced plasma light source; microlithography; size 13.5 nm; Costs; High power amplifiers; Light sources; Lithography; Manufacturing; Oscillators; Plasma materials processing; Plasma sources; Tin; Ultraviolet sources;

fLanguage

English

Publisher

ieee

Conference_Titel

Microprocesses and Nanotechnology, 2007 Digest of papers

Conference_Location

Kyoto

Print_ISBN

978-4-9902472-4-9

Type

conf

DOI

10.1109/IMNC.2007.4456089

Filename

4456089