Title :
Laser produced plasma light source for HVM-EUVL
Author :
Komori, Hiroshi ; Hoshino, Hideo ; Suganuma, Takashi ; Nowak, Krzysztof ; Yabu, Takayuki ; Asayama, Takeshi ; Ueno, Yoshifumi ; Moriya, Masato ; Nakano, Masaki ; Someya, Hiroshi ; Abe, Tamotsu ; Soumagne, Georg ; Endo, Akira ; Mizoguchi, Hakaru ; Sumitani
Author_Institution :
Extreme Ultraviolet Lithography Syst. Dev. Assoc. (EUVA), Hiratsuka
Abstract :
A major technical challenge of an extreme ultraviolet (EUV) light source for microlithography at 13.5 nm is the in-band power requirement of more than 115 W at the intermediate focus. The solution for HVM EUV lithography is a laser produced plasma light source with a cost effective CO2 drive laser and a high conversion efficiency Sn target. To demonstrate this, a LPP source is developed for high volume manufacturing EUV lithography which is based on a high power CO2 MOPA (Master Oscillator Power Amplifier) system and a tin target. It is concluded that the CO2 laser driven Sn light source is the most promising candidate for HVM EUVL due to its scalability, high efficiency and long collector mirror lifetime.
Keywords :
plasma production by laser; plasma sources; ultraviolet lithography; ultraviolet sources; CO2; CO2 laser; HVM EUV lithography; collector mirror; extreme ultraviolet light source; high power CO2 MOPA system; high power CO2 master oscillator power amplifier system; laser produced plasma light source; microlithography; size 13.5 nm; Costs; High power amplifiers; Light sources; Lithography; Manufacturing; Oscillators; Plasma materials processing; Plasma sources; Tin; Ultraviolet sources;
Conference_Titel :
Microprocesses and Nanotechnology, 2007 Digest of papers
Conference_Location :
Kyoto
Print_ISBN :
978-4-9902472-4-9
DOI :
10.1109/IMNC.2007.4456089
