• DocumentCode
    3047510
  • Title

    Development of a LPP EUV light source for below-32nm Node Lithography

  • Author

    Brandt, David ; Oga, T. ; Farrar, N. ; Bonafede, James

  • fYear
    2007
  • fDate
    5-8 Nov. 2007
  • Firstpage
    32
  • Lastpage
    33
  • Abstract
    A comprehensive review of the development activities being undertaken at Cymer in the development of a CO2 laser produced plasma (LPP) light source for EUV lithography is provided. A new and effective debris mitigation technique which greatly reduces the Ion Flux generated during exposure is also demonstrated.
  • Keywords
    plasma production by laser; ultraviolet lithography; ultraviolet sources; CO2 laser produced plasma; EUV lithography; debris mitigation technique; ion flux; light source; Coatings; Light sources; Lithography; Mirrors; Optical control; Plasma sources; Power lasers; Prototypes; Scalability; Ultraviolet sources;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Microprocesses and Nanotechnology, 2007 Digest of papers
  • Conference_Location
    Kyoto
  • Print_ISBN
    978-4-9902472-4-9
  • Type

    conf

  • DOI
    10.1109/IMNC.2007.4456090
  • Filename
    4456090
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=3047510