• DocumentCode
    3047610
  • Title

    GaAs nanowhiskers for femtosecond photodetectors and THz emitters

  • Author

    Mikulics, M. ; Zhang, Juyong ; Sobolewski, R. ; Adam, R. ; Juul, L. ; Marso, M. ; Winden, A. ; Hardtdegen, H. ; Grutzmacher, D. ; Kordos, P.

  • Author_Institution
    Peter Grunberg Inst. (PGI), Forschungszentrum Julich, Julich, Germany
  • fYear
    2012
  • fDate
    11-15 Nov. 2012
  • Firstpage
    71
  • Lastpage
    74
  • Abstract
    We have developed and characterized ultrafast and highly sensitive photodetectors based on GaAs nanowhiskers fabricated with an improved top-down etching method. We evaluated the material properties of the etched nanowhiskers by micro photoluminescence measurements and studied the effect of post annealing on nanowhiskers´ luminescence. The nanowhiskers were integrated into the coplanar striplines for device testing using DC and time-resolved electro-optic characterization techniques. Our photodetectors exhibit a very low dark current below 500 pA at 10 V bias as well as a high responsivity of 0.19 A/W at 30 V, and a cut-off frequency of 1.3 THz. These characteristics make the GaAs nanowhisker photodetectors very promising candidates for high-speed optoelectronics and efficient THz emitters.
  • Keywords
    III-V semiconductors; annealing; dark conductivity; electro-optical effects; etching; gallium arsenide; nanofabrication; nanosensors; nanostructured materials; photodetectors; photoluminescence; whiskers (crystal); DC electro-optic characterization technique; GaAs; GaAs nanowhisker photodetectors; coplanar striplines; cut-off frequency; dark current; device testing; efficient terahertz emitters; etched nanowhiskers; femtosecond photodetectors; frequency 1.3 THz; high-speed optoelectronics; highly sensitive photodetector; improved top-down etching method; material properties; microphotoluminescence measurements; nanowhisker luminescence; post annealing effect; time-resolved electro-optic characterization technique; ultrafast photodetector; voltage 10 V; voltage 30 V; Annealing; Etching; Fabrication; Gallium arsenide; Nanoscale devices; Photodetectors; Semiconductor device measurement;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Advanced Semiconductor Devices & Microsystems (ASDAM), 2012 Ninth International Conference on
  • Conference_Location
    Smolenice
  • Print_ISBN
    978-1-4673-1197-7
  • Type

    conf

  • DOI
    10.1109/ASDAM.2012.6418553
  • Filename
    6418553