DocumentCode
3047639
Title
Dual grating interferometric lithography for 22-nm node
Author
Shiotani, H. ; Suzuki, Satoshi ; Dong Gun Lee ; Naulleau, P.
Author_Institution
Hyogo Univ., Ako
fYear
2007
fDate
5-8 Nov. 2007
Firstpage
46
Lastpage
47
Abstract
Dual grating interferometric (DGI) lithography which can be operate in the usage of an incoherent EUV light source is proposed. Thus, the DGI exposure method can combine with a stand alone EUV source, such as laser produced plasma and discharge produced plasma. Therefore, this exposure system becomes a compact one for the evaluation of resolution and LER in a EUV resist.
Keywords
diffraction gratings; discharges (electric); nanolithography; plasma production by laser; ultraviolet lithography; ultraviolet sources; DGI; diffraction gratings; discharge produced plasma; dual grating interferometric lithography; incoherent EUV light source; laser produced plasma; resist; Diffraction gratings; Interference; Interferometric lithography; Light sources; Optical interferometry; Optical sensors; Plasma applications; Plasma sources; Resists; Ultraviolet sources;
fLanguage
English
Publisher
ieee
Conference_Titel
Microprocesses and Nanotechnology, 2007 Digest of papers
Conference_Location
Kyoto
Print_ISBN
978-4-9902472-4-9
Type
conf
DOI
10.1109/IMNC.2007.4456097
Filename
4456097
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