DocumentCode
3047718
Title
Novel Method for Measurement Condition Optimization in CD-SEM
Author
Hitomi, Kentarou ; Nakayama, Yoshinori ; Yamanashi, Hiromasa ; Sohda, Yasunari ; Kawada, Hiroki
Author_Institution
Hitachi, Ltd., Kokubunji
fYear
2007
fDate
5-8 Nov. 2007
Firstpage
52
Lastpage
53
Abstract
This paper introduces the Taguchi method for the optimization of measurement conditions in critical dimension-scanning electron microscope (CD-SEM). As a result, four parameter conditions are optimized for low resist shrinkage and highly precise measurement through eighteen experiments. The prediction accuracy is under 0.2 nm. Moreover, high prediction accuracy is obtained for three different ArF resists. Therefore, it is clarified that the proposed method is a promising tool for CD-measurement optimization.
Keywords
Taguchi methods; resists; scanning electron microscopy; ArF; ArF resists; Taguchi method; critical dimension-scanning electron microscope; low resist shrinkage; measurement condition optimization; precise measurement; prediction accuracy; Acceleration; Accuracy; Electron beams; Electron microscopy; Fabrication; Lithography; Optimization methods; Probes; Resists; Scanning electron microscopy;
fLanguage
English
Publisher
ieee
Conference_Titel
Microprocesses and Nanotechnology, 2007 Digest of papers
Conference_Location
Kyoto
Print_ISBN
978-4-9902472-4-9
Type
conf
DOI
10.1109/IMNC.2007.4456100
Filename
4456100
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