• DocumentCode
    3047724
  • Title

    Estimation of resist blur by overlay measurement

  • Author

    Nakao, Shuji ; Maejima, Shinroku ; Hagiwara, Takuya ; Moniwa, Akemi ; Sakai, Junjiro ; Hanawa, Tetsuro ; Suko, Kazuyuki

  • Author_Institution
    Renesas Technol., Itami
  • fYear
    2007
  • fDate
    5-8 Nov. 2007
  • Firstpage
    54
  • Lastpage
    55
  • Abstract
    A method to estimate a magnitude of resist blur by overlay measurement with a special mark. Because of utilization of optical measurement, line-end-shortening (LES) can be measured with good repeatability, resulting in accurate estimation of a magnitude of resist blur. This method is very useful to estimate resist blur in an advanced lithography era.
  • Keywords
    optical instruments; photoresists; line-end-shortening; lithography; optical measurement; overlay measurement; resist blur; Chemical compounds; Chemical technology; Convolution; Image resolution; Lithography; Optical films; Optical sensors; Resists; Shape; Stability;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Microprocesses and Nanotechnology, 2007 Digest of papers
  • Conference_Location
    Kyoto
  • Print_ISBN
    978-4-9902472-4-9
  • Type

    conf

  • DOI
    10.1109/IMNC.2007.4456101
  • Filename
    4456101
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=3047724