• DocumentCode
    3047840
  • Title

    Lithography using focused high-energy proton beam for fabrication of high-aspect-ratio microstructures

  • Author

    Nishikawa, H. ; Furuta, Y. ; Uchiya, N. ; Haga, J. ; Oikawa, M. ; Satoh, T. ; Ishii, Y. ; Kamiya, T.

  • Author_Institution
    Shibaura Inst. of Technol., Tokyo
  • fYear
    2007
  • fDate
    5-8 Nov. 2007
  • Firstpage
    66
  • Lastpage
    67
  • Abstract
    This report demonstrates the three-dimensional fabrication capability of the proton beam writing (PBW) method. Recent activities of PBW in view of applications for MEMS and biosensors are also discussed.
  • Keywords
    biosensors; ion beam lithography; micromechanical devices; proton beams; MEMS; biosensors; focused proton beam; high-aspect-ratio microstructures; high-energy proton beam; lithography; microstructure fabrication; proton beam writing; three-dimensional fabrication; Fabrication; Lithography; Micromachining; Micromechanical devices; Microstructure; Particle beams; Protons; Resists; Scanning electron microscopy; Writing;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Microprocesses and Nanotechnology, 2007 Digest of papers
  • Conference_Location
    Kyoto
  • Print_ISBN
    978-4-9902472-4-9
  • Type

    conf

  • DOI
    10.1109/IMNC.2007.4456107
  • Filename
    4456107
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=3047840