Title :
Effect of Fluorine Atom on Acid Generation in Chemically Amplifiled EUV Resist
Author :
Yamamoto, Hiroki ; Kozawa, T. ; Tagawa, Seiichi ; Yukawa, Hiroto ; Sato, Mitsuru ; Onodera, Junichi
Author_Institution :
Osaka Univ., Osaka
Abstract :
In this study, the effect of fluorine atoms on acid generation upon EUV exposure using an acid sensitive dye is investigated. Fluorinated polymers is used as polymers. Triphenylsulfonium-triflate (TPS-tf) is used as an acid generator. Coumarin6 (C6, Aldrich Chem.) is used as an indicator to evaluate acid yields. Tetrahydrofuran (THF, Wako) is used as a casting solvent. It is experimentally confirmed that the increase in the absorption coefficient of polymers leads to the increase in the acid yield.
Keywords :
dyes; indicators; polymer films; polymers; resists; thin films; ultraviolet lithography; Coumarin6; absorption coefficient; acid generation; acid generator; acid sensitive dye; chemically amplified extreme ultraviolet resist; extreme ultraviolet lithography; film thickness; fluorinated polymers; fluorine atom effect; indicator; tetrahydrofuran; triphenylsulfonium-triflate; Absorption; Casting; Chemical industry; Electronic mail; Electrons; Lead; Lithography; Polymer films; Resists; Ultraviolet sources;
Conference_Titel :
Microprocesses and Nanotechnology, 2007 Digest of papers
Conference_Location :
Kyoto
Print_ISBN :
978-4-9902472-4-9
DOI :
10.1109/IMNC.2007.4456112
