Title :
Study on the reaction of acid generators with epithermal electrons
Author :
Natsuda, K. ; Kozawa, T. ; Saeki, A. ; Tagawa, S. ; Kai, T. ; Shimokawa, T.
Author_Institution :
Osaka Univ., Osaka
Abstract :
In this study, the reaction of typical acid generators with epithermal electrons by observing the decrease in the initial yield of THF solvated electrons caused by the addition of acid generators is investigated. Chemically amplified resists have been widely used as a mainstream resist technology. In EB and EUV resists, secondary electrons sensitize acid generators.
Keywords :
organic compounds; reaction rate constants; resists; solvated electrons; solvation; EB resist; EUV resist; THF solvated electrons; acid generators; chemically amplified resists; epithermal electrons; rate constants; Argon; Chemical industry; Chemical technology; Electron optics; Energy loss; Ionization; Kinetic theory; Optical pulses; Resists; Ultrafast optics;
Conference_Titel :
Microprocesses and Nanotechnology, 2007 Digest of papers
Conference_Location :
Kyoto
Print_ISBN :
978-4-9902472-4-9
DOI :
10.1109/IMNC.2007.4456113
