DocumentCode
3047990
Title
Dependence of Absorption Coefficient and Acid Generation Efficiency on Acid Generator Concentration in Chemically Amplified EUV Resist
Author
Hirose, Ryo ; Kozawa, Takahiro ; Tagawa, Seiichi ; Kai, Toshiyuki ; Shimokawa, Tsutomu
Author_Institution
Osaka Univ., Ibaraki
fYear
2007
fDate
5-8 Nov. 2007
Firstpage
84
Lastpage
85
Abstract
In this study, the number of acid molecules generated in a model system of chemically amplified EUV resist was evaluated using an acid sensitive dye. Also, the absorption coefficient is a critical factor for the resist design. A convenient method to estimate the absorption coefficient of resists was proposed.
Keywords
absorption coefficients; dyes; photoresists; ultraviolet lithography; EUV resist; absorption coefficient; acid generation efficiency; acid generator concentration; acid sensitive dye; chemical amplification; Absorption; Chemical industry; Electronic mail; Electronics industry; Mass production; Optical films; Polymers; Protons; Resists; Ultraviolet sources;
fLanguage
English
Publisher
ieee
Conference_Titel
Microprocesses and Nanotechnology, 2007 Digest of papers
Conference_Location
Kyoto
Print_ISBN
978-4-9902472-4-9
Type
conf
DOI
10.1109/IMNC.2007.4456116
Filename
4456116
Link To Document