• DocumentCode
    3048010
  • Title

    Depth profile of acid generator distribution in chemically amplified resists

  • Author

    Fukuyama, Takehiro ; Kozawa, T. ; Tagawa, Seiichi ; Takasu, Ryoichi ; Yukawa, Hidenori ; Sato, Mitsuru ; Onodera, Junichi ; Hirosawa, Ichiro ; Koganesawa, Tomoyuki ; Horie, Kazuyuki

  • Author_Institution
    Osaka Univ., Osaka
  • fYear
    2007
  • fDate
    5-8 Nov. 2007
  • Firstpage
    86
  • Lastpage
    87
  • Abstract
    The depth profile of acid generator distribution is investigated using X-ray reflectivity measurement at Spring-8. The depth profile in tBu-PHS thin resist films is made clear.
  • Keywords
    X-ray reflection; nanolithography; polymer films; resists; Spring-8; X-ray reflectivity; acid generator distribution; depth profile; lithography; poly(4-hydroxystyrene); tBu-PHS; tert-butyl groups; thin resist films; Anti-freeze; Chemical industry; Mass production; Optical films; Reflectivity; Resists; Semiconductor devices; Semiconductor thin films; Synchrotron radiation; Thin film devices;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Microprocesses and Nanotechnology, 2007 Digest of papers
  • Conference_Location
    Kyoto
  • Print_ISBN
    978-4-9902472-4-9
  • Type

    conf

  • DOI
    10.1109/IMNC.2007.4456117
  • Filename
    4456117
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=3048010