Title :
Depth profile of acid generator distribution in chemically amplified resists
Author :
Fukuyama, Takehiro ; Kozawa, T. ; Tagawa, Seiichi ; Takasu, Ryoichi ; Yukawa, Hidenori ; Sato, Mitsuru ; Onodera, Junichi ; Hirosawa, Ichiro ; Koganesawa, Tomoyuki ; Horie, Kazuyuki
Author_Institution :
Osaka Univ., Osaka
Abstract :
The depth profile of acid generator distribution is investigated using X-ray reflectivity measurement at Spring-8. The depth profile in tBu-PHS thin resist films is made clear.
Keywords :
X-ray reflection; nanolithography; polymer films; resists; Spring-8; X-ray reflectivity; acid generator distribution; depth profile; lithography; poly(4-hydroxystyrene); tBu-PHS; tert-butyl groups; thin resist films; Anti-freeze; Chemical industry; Mass production; Optical films; Reflectivity; Resists; Semiconductor devices; Semiconductor thin films; Synchrotron radiation; Thin film devices;
Conference_Titel :
Microprocesses and Nanotechnology, 2007 Digest of papers
Conference_Location :
Kyoto
Print_ISBN :
978-4-9902472-4-9
DOI :
10.1109/IMNC.2007.4456117
