DocumentCode
3048023
Title
A Study of Molecular Orientation Effect in Photoresist Films
Author
Kaneyama, Koji ; Toriumi, Minoru ; Itani, Toshiro
Author_Institution
Semicond. Leading Edge Technol., Inc., Ibaraki
fYear
2007
fDate
5-8 Nov. 2007
Firstpage
88
Lastpage
89
Abstract
In this paper, an investigation is made focusing on the molecular orientation in the resist film, the understanding and control of which will be very significant in the research and development of EUV resists. Molecular orientation can be investigated through fluorescence spectrometry. Based on the results, high viscosity resist solutions showed strong molecular orientation characteristics compared to that of the low viscosity resist solution given the same resist film thickness condition.
Keywords
fluorescence; molecular orientation; organic compounds; photoresists; thin films; viscosity; EUV resists; fluorescence spectrometry; molecular orientation effect; photoresist films; pyrene; resist film thickness; viscosity resist solutions; Additives; Chemical technology; Fluorescence; Lead compounds; Research and development; Resists; Semiconductor films; Spectroscopy; Ultraviolet sources; Viscosity;
fLanguage
English
Publisher
ieee
Conference_Titel
Microprocesses and Nanotechnology, 2007 Digest of papers
Conference_Location
Kyoto
Print_ISBN
978-4-9902472-4-9
Type
conf
DOI
10.1109/IMNC.2007.4456118
Filename
4456118
Link To Document