Title :
Study on Physical Properties of Organic Resist Spacers on Color Filters
Author :
Koo, H.S. ; Kang, C.H. ; Kawai, T.
Author_Institution :
Osaka Univ., Osaka
Abstract :
The nano-particle photo spacers with superior physical characteristics has technically fabricated into the defined pattern using lithographic processes in color filters manufacture processing. Cylinder-like photo spacers with several heights on the surface of subpixel cells in the defined pattern can be achieved by modulating process parameters. The dimension, height and shape of photo spacers are consistent with the designed pattern size in the mask and promise the reliable stability of the photo spacer materials. Elastic recovery ratio of the defined pattern photo spacers is initially increased and then decreased with the increase of the applied loading.
Keywords :
elasticity; liquid crystal displays; masks; nanoparticles; nanotechnology; optical fabrication; optical filters; organic compounds; photoresists; color filters; elastic recovery; liquid crystal display; lithographic process; mask; nanoparticle photo spacers materials; organic resist spacers; Color; Elastic recovery; Filters; Indium tin oxide; Resists; Shape; Space technology; Substrates; Temperature; Thin film transistors; Photo spacers; color filter; elastic recovery ratio; lithographic process; photo resist; subpixel cell;
Conference_Titel :
Microprocesses and Nanotechnology, 2007 Digest of papers
Conference_Location :
Kyoto
Print_ISBN :
978-4-9902472-4-9
DOI :
10.1109/IMNC.2007.4456123
