Title :
Study of aluminum film deposition on the surface of micro-trench by dual ion beam sputtering
Author :
Tsai, Hung-Yin ; Kuo, Kei-Lin ; Wu, Chih-Wei
Author_Institution :
Nat. Tsing Hua Univ., Hsinchu
Abstract :
In this study, dual ion beam sputtering were firstly used to deposit film on the surface of micro-trenches. Aluminum thin films were deposited on silicon substrates with micro-trenches of high aspect ratio. From the results, the dual ion beam system shows good step coverage and uniformity of film on the micro-trench.
Keywords :
aluminium; ion beam assisted deposition; metallic thin films; sputter deposition; Al; Si; aluminum film deposition; dual ion beam sputtering; film uniformity; high aspect ratio microtrench; silicon substrate; Aluminum; Atomic beams; Atomic layer deposition; Automotive engineering; Ion beams; Ocean temperature; Sea surface; Semiconductor films; Sputtering; Substrates;
Conference_Titel :
Microprocesses and Nanotechnology, 2007 Digest of papers
Conference_Location :
Kyoto
Print_ISBN :
978-4-9902472-4-9
DOI :
10.1109/IMNC.2007.4456163
