Feasibility and study on rapid fabrication of 2D photonic crystal slab waveguides by combining near-field phase-shifting contact lithography and interference lithography

We propose a potentially rapid method that combines near-field phase-shifting contact lithography (NFPSCL) and IL to fabricate 2D photonic crystal slab waveguides This technique provides an especially simple method for forming feature size of 100 to 1100 nm in photoresist by using an incoherent and broadband UV light. The elastomeric phase mask was fabricated by casting and curing the prepolymer of PDMS that was transparent to visible and near-ultraviolet light against photo-lithographically patterned lines of photoresist on a silicon substrate.This elastomeric phase mask fabricated by using this procedure was allowed to come into conformable contact with the resist.