Nano-pore arrays of anodic aluminum oxide fabricated using a Cr mask

Anodic aluminum oxide (AAO), typical material with a self-organized porous structure, has recently attracted due to its many potential technical applications such as magnetic, electronic, and optoelectronic device (Whitney et al., 1993 and Rahman and Yang, 2003). There is a great demand for highly ordered and patterned nano-pore arrays. These studies have been reported by prepatterning the Al films and lithographical approaches (Sun and Kim, 2002 and Yasui et al., 2005). To array alumina pore, in this study, Cr and SiO₂ layer deposited on Al thin film, which were patterned by electron beam lithography and ion milling and were used as anodizing mask before anodizing. The effects of mask pattern on alumina pore array were investigated by the various shape and size of Cr mask and different anodic voltage during the anodizing process.