Title :
Focused electron beam induced etching and in-situ monitoring: Fabrication of sub-beam sized nanoholes
Author :
Miyazoe, H. ; Utke, I. ; Michler, J. ; Terashima, K.
Author_Institution :
EMPA - Mater. Sci. & Technol., Thun
Abstract :
In this work, the control of focused ion beam induced deposition (FEBIE) process is examined through fabrication of nanoholes on 10-nm-thin amorphous carbon (a-C) membrane using H2O and XeF2 precursor, and its in-situ stage current measurement. Nanoholes with diameters smaller than the beam size were successfully obtained. Results indicate the feasibility of fabrication of nanoholes with sub-nm diameter in the future.
Keywords :
amorphous state; carbon; electron beam effects; focused ion beam technology; membranes; nanostructured materials; nanotechnology; sputter etching; C; amorphous carbon membrane; focused electron beam induced etching; stage current data; subbeam sized nanoholes; Biomembranes; Current measurement; Electron beams; Electron emission; Etching; Fabrication; Materials science and technology; Monitoring; Probes; Scanning electron microscopy;
Conference_Titel :
Microprocesses and Nanotechnology, 2007 Digest of papers
Conference_Location :
Kyoto
Print_ISBN :
978-4-9902472-4-9
DOI :
10.1109/IMNC.2007.4456200
