DocumentCode
3049673
Title
Sub-50nm featured polymer stamp fabrication for UV nanoimprint lithography
Author
Hong, Sung-Hoon ; Hwang, Jae-Yeon ; Lee, Heon
Author_Institution
Korea Univ., Seoul
fYear
2007
fDate
5-8 Nov. 2007
Firstpage
286
Lastpage
287
Abstract
Using hot embossing lithography, 8-inch sized sub-50 nm featured flexible polymer template was clearly fabricated. UV-NIL process was taken on Si substrate with the polymer stamp and sub-50 nm pattern was successfully fabricated on Si substrate.
Keywords
nanolithography; polymers; soft lithography; ultraviolet lithography; Si; Si substrate; UV nanoimprint lithography; UV-NIL process; hot embossing lithography; polymer stamp fabrication; Coatings; Curing; Embossing; Fabrication; Lithography; Materials science and technology; Nanolithography; Polymer films; Substrates; Temperature;
fLanguage
English
Publisher
ieee
Conference_Titel
Microprocesses and Nanotechnology, 2007 Digest of papers
Conference_Location
Kyoto
Print_ISBN
978-4-9902472-4-9
Type
conf
DOI
10.1109/IMNC.2007.4456216
Filename
4456216
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