• DocumentCode
    3049699
  • Title

    Fabrication of Glassy Carbon Molds Using Hydrogen Silsequioxane Patterned by Electron Beam Lithography as O2 Dry Etching Mask

  • Author

    Yasui, M. ; Sugiyama, Y. ; Takahashi, M. ; Kaneko, S. ; Uegaki, J. ; Hirabayashi, Y. ; Maeda, R.

  • Author_Institution
    Kanagawa Ind. Technol. Center, Kanagawa
  • fYear
    2007
  • fDate
    5-8 Nov. 2007
  • Firstpage
    290
  • Lastpage
    291
  • Abstract
    In this article, the glassy carbon molds using hydrogen silsequioxane (HSQ) patterned by electron beam lithography (EBL) as O2 dry etching mask was fabricated. The use HSQ pattern written by EBL for O2 etching mask showed that the pattern is available for use in an etching mask to O2 plasma.
  • Keywords
    carbon; electron beam lithography; etching; glass; materials preparation; organic compounds; C; O2 dry etching mask; O2 plasma; electron beam lithography; glassy carbon mold fabrication; hydrogen silsequioxane pattern; Dry etching; Electron beams; Fabrication; Glass industry; Hydrogen; Lithography; Manufacturing industries; Microstructure; Organic materials; Plasma applications;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Microprocesses and Nanotechnology, 2007 Digest of papers
  • Conference_Location
    Kyoto
  • Print_ISBN
    978-4-9902472-4-9
  • Type

    conf

  • DOI
    10.1109/IMNC.2007.4456218
  • Filename
    4456218
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=3049699