Title :
Effect of a photo-crosslinkable chemisorbed monolayer on thermal nanoimprinting of a poly(styrene) thin film on a gold substrate
Author :
ODA, Hirokazu ; OHTAKE, Tomoyuki ; TAKAOKA, Toshiaki ; NAKAGAWA, Masaru
Author_Institution :
Tokyo Inst. of Technol., Yokohama
Abstract :
In this study, a photo-crosslinkable chemisorbed monolayer is designed between metal and resist layers to carry out thermal nanoimprinting of a non-polar poly(styrene) (PSt) thin film on a gold surface. The monolayer is composed of a molecule containing a thiol group as a chemisorption site to a gold surface. Benzophenone moiety reacts with a C-H bond in PSt as a photo-cross-linkable unit by UV-exposure. The effect of the photo-crosslinkable chemisorbed monolayer on thermal nanoimprinting of a poly(styrene) thin film on a gold substrate is investigated. The results showed strengthened adhesion of the PSt layer to the gold substrate surface.
Keywords :
adhesion; bonds (chemical); chemisorbed layers; chemisorption; monolayers; nanolithography; photoresists; polymer films; soft lithography; ultraviolet lithography; Au; C-H bond; PSt layer; UV irradiation; adhesion; benzophenone moiety; chemisorption site; gold substrate; metal layer; nonpolar poly(styrene) thin film; photocrosslinkable chemisorbed monolayer; photoresist; resist layers; thermal nanoimprinting; thiol group; Adhesives; Atomic force microscopy; Chemical technology; Gold; Resists; Scanning electron microscopy; Substrates; Surface morphology; Thermal resistance; Transistors;
Conference_Titel :
Microprocesses and Nanotechnology, 2007 Digest of papers
Conference_Location :
Kyoto
Print_ISBN :
978-4-9902472-4-9
DOI :
10.1109/IMNC.2007.4456227
