Title :
Impact of mold geometries and imprinted resist thickness on velocity fields for nanoimprint lithography
Author :
Lin, Chien-Hung ; Chen, Rongshun
Author_Institution :
Nat. Tsing Hua Univ., Hsinchu
Abstract :
The effects of mold geometries and imprinted resist thickness on the polymer flow using numerical simulations during nanoimprint lithography is investigated. The velocity fields, including the lateral and vertical velocity, is studied to describe the mode of the polymer deformation, which is the key role to determine the mechanism of nanoimprint forming.
Keywords :
deformation; nanolithography; polymers; imprinted resist thickness; mold geometries; nanoimprint forming; nanoimprint lithography; polymer deformation; polymer flow; Boundary conditions; Computational geometry; Costs; Fabrication; Mechanical engineering; Nanolithography; Polymers; Resists; Solid modeling; Weight control;
Conference_Titel :
Microprocesses and Nanotechnology, 2007 Digest of papers
Conference_Location :
Kyoto
Print_ISBN :
978-4-9902472-4-9
DOI :
10.1109/IMNC.2007.4456232
