Title :
A Novel Projection Exposure System Using a Gradient-Index Lens Array
Author :
Kobayashi, Hideo ; Horiuchi, Toshiyuki
Author_Institution :
Tokyo Denki Univ., Tokyo
Abstract :
Lithography for printing rough patterns with widths of 1-10 mum in a large area is widely applied for fabricating various micromechanical components. Since the production volume is usually far smaller than that for universal electronics devices, however, expensive lithography systems are not easily adopted to the production. In this research, a novel low-cost projection exposure system is proposed, and its feasibility is investigated. A gradient-index lens array is used as the projection optics, and the array is scanned. The light intensity distribution caused by the array structure is investigated and the highly resoluble potential is clarified.
Keywords :
lenses; lithography; optical projectors; array structure; gradient-index lens array; light intensity distribution; lithography; micromechanical components; projection exposure system; projection optics; rough patterns; Glass; Lamps; Lenses; Lighting; Lithography; Micromechanical devices; Optical arrays; Printing; Production systems; Resists;
Conference_Titel :
Microprocesses and Nanotechnology, 2007 Digest of papers
Conference_Location :
Kyoto
Print_ISBN :
978-4-9902472-4-9
DOI :
10.1109/IMNC.2007.4456258
