Title :
Emerging Nanopatterning Methods
Author_Institution :
VTT Micro & Nanoelectron., Espoo
Abstract :
The emerging nanopatterning methods (NaPa) consortium integrates new patterning methods into one project, both anticipating and responding to the increasing need for nanopatterning technologies, standards and metrology required to harness the new application-relevant properties of engineered structures with nm-scale features. To achieve this, research in three technology strands is carried out. The technologies are nanoimprint lithography, soft lithography & self-assembly and MEMS-based nanopatterning.
Keywords :
micromechanical devices; nanolithography; nanopatterning; self-assembly; soft lithography; MEMS; nanoimprint lithography; nanopatterning; self-assembly; soft lithography; Biotechnology; Metrology; Microelectronics; Nanopatterning; Nanophotonics; Nanotechnology; Photonics; Polymers; Self-assembly; Soft lithography;
Conference_Titel :
Microprocesses and Nanotechnology, 2007 Digest of papers
Conference_Location :
Kyoto
Print_ISBN :
978-4-9902472-4-9
DOI :
10.1109/IMNC.2007.4456274
