DocumentCode
3050640
Title
Emerging Nanopatterning Methods
Author
Ahopelto, Jouni
Author_Institution
VTT Micro & Nanoelectron., Espoo
fYear
2007
fDate
5-8 Nov. 2007
Firstpage
402
Lastpage
402
Abstract
The emerging nanopatterning methods (NaPa) consortium integrates new patterning methods into one project, both anticipating and responding to the increasing need for nanopatterning technologies, standards and metrology required to harness the new application-relevant properties of engineered structures with nm-scale features. To achieve this, research in three technology strands is carried out. The technologies are nanoimprint lithography, soft lithography & self-assembly and MEMS-based nanopatterning.
Keywords
micromechanical devices; nanolithography; nanopatterning; self-assembly; soft lithography; MEMS; nanoimprint lithography; nanopatterning; self-assembly; soft lithography; Biotechnology; Metrology; Microelectronics; Nanopatterning; Nanophotonics; Nanotechnology; Photonics; Polymers; Self-assembly; Soft lithography;
fLanguage
English
Publisher
ieee
Conference_Titel
Microprocesses and Nanotechnology, 2007 Digest of papers
Conference_Location
Kyoto
Print_ISBN
978-4-9902472-4-9
Type
conf
DOI
10.1109/IMNC.2007.4456274
Filename
4456274
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