DocumentCode
3050665
Title
Optimal resist dispensing in step and flash NIL
Author
Sirotkin, Vadim ; Svintsov, Alexander ; Zaitsev, Sergey
Author_Institution
RAS, Moscow
fYear
2007
fDate
5-8 Nov. 2007
Firstpage
406
Lastpage
407
Abstract
Development of algorithm for drop dispensing optimization in ultraviolet nanoimprint lithography (UV-NIL) considering optimal filling of a stamp is reported.
Keywords
nanolithography; optimisation; ultraviolet lithography; drop dispensing optimization; nanoimprint lithography; ultraviolet lithography; Chemical technology; Control system synthesis; Filling; Geometry; Microelectronics; Nanolithography; Resists; Standards development; Testing; Thermal resistance;
fLanguage
English
Publisher
ieee
Conference_Titel
Microprocesses and Nanotechnology, 2007 Digest of papers
Conference_Location
Kyoto
Print_ISBN
978-4-9902472-4-9
Type
conf
DOI
10.1109/IMNC.2007.4456276
Filename
4456276
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