Title :
High-Speed Scanning Electron Microscopy using Distributed-axis Electron Optics
Author :
Pease, R. Fabian ; Pickard, Daniel S. ; Tanimoto, Sayaka
Author_Institution :
Stanford Univ., Stanford
Abstract :
In this paper, distributed-axis technology is applied to high-speed scanning electron microscopy for large scale inspection and metrology of nanostructures. Simulated results indicate that each aperture in the retarding electrode must be kept to less than 0.1mm diameter to avoid extra aberrations and that extra slots be provided to accommodate the spread in the trajectories of the secondary electrons with different energies (up to 10eV)4. Experimental verification of these simulated results is underway.
Keywords :
electron optics; inspection; nanotechnology; scanning electron microscopy; distributed axis electron optics; high speed scanning electron microscopy; large scale inspection; metrology; nanostructures; secondary electrons; Acceleration; Apertures; Detectors; Electron beams; Electron optics; Inspection; Lithography; Optical microscopy; Scanning electron microscopy; Throughput;
Conference_Titel :
Microprocesses and Nanotechnology, 2007 Digest of papers
Conference_Location :
Kyoto
Print_ISBN :
978-4-9902472-4-9
DOI :
10.1109/IMNC.2007.4456280
