Two-dimensional Arrangement of Vertically Oriented Cylindrical Domains of Diblock Copolymers using Graphoepitaxy with Artificial Guiding Pattern Layout

In this paper, we demonstrate that a two-dimensional arrangement of vertical cylindrical domains of asymmetric poly(styrene-b-methyl methacrylate) (PSt-b-PMMA) is achieved by graphoepitaxy using a resist pattern as the guide for alignment. The key to success is the combination of the neutralization of a bottom surface and the introduction of a two-dimensional hydrophilic guiding pattern, which leads to vertical orientation and lateral arrangement of cylindrical domains, respectively.