Title :
Outgas Quantification Analysis of EUV Resists
Author :
Santillan, Julius Joseph ; Kobayashi, Shinji ; Itani, Toshiro
Author_Institution :
Semicond. Leading Edge Technol., Inc. (Selete), Ibaraki
Abstract :
Outgas quantification using a variation of the pressure rise method was developed and applied. Various outgassing release characteristics were observed after the evaluation of a number of EUV resists.
Keywords :
outgassing; photoresists; ultraviolet lithography; EUV resists; outgas quantification; outgassing release characteristics; pressure rise method; Elementary particle vacuum; Equations; Gas chromatography; Lithography; Mass spectroscopy; Mirrors; Resists; Ultraviolet sources; Vacuum systems; Vacuum technology;
Conference_Titel :
Microprocesses and Nanotechnology, 2007 Digest of papers
Conference_Location :
Kyoto
Print_ISBN :
978-4-9902472-4-9
DOI :
10.1109/IMNC.2007.4456291
