Quick Cavity Filling in UV-Nanoimprint Using Pentafluoropropane

Author

Hiroshima, Hiroshi

Author_Institution

Nat. Inst. of Adv. Ind. Sci. & Technol., Tsukuba

fYear

2007

fDate

5-8 Nov. 2007

Firstpage

446

Lastpage

447

Abstract

UV-nanoimprint in air suffers the bubble defect problem. It was found that bubble elimination can be completed in several seconds by pentafluoropropane even where bubbles remain in 10 min in air. However, the time required for bubble elimination is not precisely determined since limited UV-nanoimprint results were available for determining the time. In this paper, the time required for bubble elimination by pentafluoropropane was precisely determined through a real time monitoring of cavity filling in UV-nanoimprint. The time evolution of a cavity being filled with resin in UV-nanoimprint at time intervals of 0.3 s was observed using optical microscope images. The required time for bubble elimination by pentafluoropropane was 1.5 s. It was believed that high-throughput and reliable UV-nanoimprint would be realized by pentafluoropropane.

Keywords

bubbles; nanolithography; optical microscopy; resins; soft lithography; ultraviolet lithography; UV-nanoimprint; bubble defect; cavity filling; optical microscopy; pentafluoropropane; real time monitoring; Assembly; Equations; Filling; Lenses; Monitoring; Optical microscopy; Resins; Throughput;

fLanguage

English

Publisher

ieee

Conference_Titel

Microprocesses and Nanotechnology, 2007 Digest of papers

Conference_Location

Kyoto

Print_ISBN

978-4-9902472-4-9

Type

conf

DOI

10.1109/IMNC.2007.4456296

Filename

4456296