Title :
Quick Cavity Filling in UV-Nanoimprint Using Pentafluoropropane
Author :
Hiroshima, Hiroshi
Author_Institution :
Nat. Inst. of Adv. Ind. Sci. & Technol., Tsukuba
Abstract :
UV-nanoimprint in air suffers the bubble defect problem. It was found that bubble elimination can be completed in several seconds by pentafluoropropane even where bubbles remain in 10 min in air. However, the time required for bubble elimination is not precisely determined since limited UV-nanoimprint results were available for determining the time. In this paper, the time required for bubble elimination by pentafluoropropane was precisely determined through a real time monitoring of cavity filling in UV-nanoimprint. The time evolution of a cavity being filled with resin in UV-nanoimprint at time intervals of 0.3 s was observed using optical microscope images. The required time for bubble elimination by pentafluoropropane was 1.5 s. It was believed that high-throughput and reliable UV-nanoimprint would be realized by pentafluoropropane.
Keywords :
bubbles; nanolithography; optical microscopy; resins; soft lithography; ultraviolet lithography; UV-nanoimprint; bubble defect; cavity filling; optical microscopy; pentafluoropropane; real time monitoring; Assembly; Equations; Filling; Lenses; Monitoring; Optical microscopy; Resins; Throughput;
Conference_Titel :
Microprocesses and Nanotechnology, 2007 Digest of papers
Conference_Location :
Kyoto
Print_ISBN :
978-4-9902472-4-9
DOI :
10.1109/IMNC.2007.4456296