Using FIB SEM to control the critical dimensions of nano-structured materials

Application of state-of-the-art focused ion beam technology (FIB), in combination with high-performance scanning electron microscopy (SEM), gives the ability to perform advanced nanofabrication, via sputtering or chemical vapor deposition. Numerous parameters must be considered in order to achieve high quality results, particularly where stringent critical dimensions are required or when dealing with challenges such as electrically insulating and/or soft materials.