DocumentCode :
3051344
Title :
Application Oriented Micro-Nano Electro Mechanical Systems
Author :
Esashi, Masayoshi ; Ono, Takahito
Author_Institution :
Tohoku Univ., Sendai
fYear :
2007
fDate :
5-8 Nov. 2007
Firstpage :
480
Lastpage :
481
Abstract :
Micromachining is an extended IC fabrication based on photo-fabrication, deep etching, anodic bonding and other advanced process technologies. This is used to produce MEMS (Micro Electro Mechanical Systems) featuring multi-functions, small size and low cost. Nanostructures such as CNT (Carbon Nano Tube) can be also included in the MEMS by nanomachining. MEMS are used as value added key components in systems. Examples of application oriented MEMS developed with attention to packaging and circuit integration will be described below. Silicon rotational gyroscope has been developed for the purpose of motion control and navigation. The principle and the photograph are shown. A 1.5 mm diameter silicon ring which is electrostatically levitated by digital control using capacitive position sensing and electrostatic actuation is rotated at 75,000 rpm. The rotation is based on the principle of a variable capacitance motor. A 5mum radial gap between the ring rotor and stator electrodes is formed using deep RIE (Reactive Ion Etching) of a silicon wafer. The silicon is anodically bonded on both sides to glasses which have electrodes. The chip is packaged in a vacuum cavity to prevent a viscous dumping. This inertia measurement system can measure two axes rotation and three axes acceleration simultaneously with high precision (sensitivity 0.01 deg/s and 0.2mG respectively).
Keywords :
carbon nanotubes; electrodes; electrostatic actuators; elemental semiconductors; etching; integrated circuit packaging; micromachining; micromechanical devices; silicon; stators; CNT; IC fabrication; MEMS; Si; capacitive position sensing; carbon nanotube; deep RIE; deep etching; electrodes; electrostatic actuation; microelectromechanical systems; micromachining; nanomechanical systems; nanostructured materials; packaging; photofabrication; reactive ion etching; ring rotor; silicon rotational gyroscope; silicon wafer; stator electrodes; variable capacitance motor; Electrodes; Etching; Fabrication; Mechanical systems; Micromachining; Micromechanical devices; Packaging; Rotation measurement; Semiconductor device measurement; Silicon;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microprocesses and Nanotechnology, 2007 Digest of papers
Conference_Location :
Kyoto
Print_ISBN :
978-4-9902472-4-9
Type :
conf
DOI :
10.1109/IMNC.2007.4456313
Filename :
4456313
Link To Document :
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